Nội dung

383 The Wafer Alignment Algorithm Regardless of Rotational Center The alignment space is on 2D, the alignment procedure carries out translation and rotational motion. The movement can be described by rigid body transformation and the coordinate after the motion can be calculated simply by multiplying matrices. The notation of the translational matrix usually has a ‘T’, the rotational matrix has an ‘R’ and the center of rotation has a ‘C’. Then the transformation is formulated by equation (2). P ′ = T { R ( P − C ) + C} (2) TR matrices in the wafer alignment system can be derived as equations (3) and (4), which are 4 × 4 matrices. ⎡1 ⎢0 T =⎢ ⎢0 ⎢ ⎣0 0 1 0 0 0 0 1 0 Δx ⎤ Δy ⎥⎥ 0⎥ ⎥ 1⎦ ⎡cos Δθ − sin Δθ ⎢ sin Δθ cos Δθ R=⎢ ⎢ 0 0 ⎢ 0 ⎣ 0 (3) 0 0 1 0 0 ⎤ 0 ⎥⎥ Δθ ⎥ ⎥ 1 ⎦ (4) 2.2 Basic alignment algorithm(Kim et al, 2006) The wafer has marks for alignment. The ideal mark position Pt is stored when the wafer is perfectly aligned. Misalignment is calculated from the current position Pc. The vision system inspects the location of the mark on the screen. These mark positions can be defined as follows. Pt = ( xt y t θ t 1) T Pc = ( xc y c θ c 1) T (5) When the current position of the mark is deviated from the ideal one, the resulting displacement can be defined as 4. The mark position in the machine can be obtained from the target position and the displacement by equation (6). Pc ≈ Pt + Δ = (xc + Δx, yc + Δy, θc + Δθ, 1 )T (6) If the current position is compensated with an arbitrary value α = (α x, α y, α θ, 0), the mark will be located at the target position. So, an alignment algorithm f(x) can be written by equation (7). f(Pc ,α ) − Pt = 0 (7) f(Pc,α) can be replaced with the equation from the rigid body transformation. The result is shown as (8). The T and R have the unknown compensation variable for the current position. 384 Desktop\New Approaches in Automation and Robotics T{R(Pc − C) + C} − Pt = 0 (8) The plus direction between the mathematical coordinate and vision can be reverse, and the relation can be written by vision direction matrix Dv whose diagonal terms have a value of either +1 or -1 and the other terms are zero. T{R(Pt + Dv Δ − C) + C} − Pt = 0 (9) The direction problem can occur between the math coordinate and the machine, and the machine direction matrix Dm has the similar characteristics as Dv. β = Dmα β = ( β x β y β θ 1) T (10) The unknown α can be calculated from the equation, and (11) and (12) are the exact solution in the case when two points are inspected to align a line. α xn = xtn -C x -(xcn -C x ) cos θ n + (y cn -C y ) sin θ n α yn = y tn -C y -(xcn -C x ) sin θ n -(y cn -C y ) cos θ n tan α θ = (xc1 − x c 2 )(y t1 − y t 2 ) − (y c1 − y c 2 )(xt1 − xt 2 ) (xt1 − xt 2 )(xc1 − x c 2 ) + (y t1 − y t 2 )(y c1 − y c 2 ) (11) (12) 3. Centerless model 3.1 Simplification The equations (11) and (12) are the exact solution, but estimated solutions have been used for many numerical problems. Some variables can be erased by geometric relations and alignment conditions. Fig. 2 shows the general condition for wafer alignment in the dicing process. First, angular misalignment in the process is within ±2o, which means sin α ≈ α and cos α ≈ 1. the equation (11) can be written as follows α xn = xtn -xcn + (y cn -C y ) sin α θn = − Δxn + (y cn -C y )α θn α yn = y tn -y cn -(xcn -C x ) sin α θn = − Δyn − (xcn -C x )α θn (13) Second, inspection is carried out at two points, and the compensation value is the average, α=(α1+α2)/2. And the inspection points are axis-symmetric at the rotational center, 2Cx−(xc1+xc2)=0. Another assumption is that the mark position is defined near the rotational center, 2Cy−(yc1+yc2) = 0. Therefore, the equation (13) can be expressed as (14). α xn = −(Δx1 + Δx 2 )/ 2 α yn = −(Δy1 + Δy 2 )/ 2 (14) The x-stroke of two points is actually constant, l=xt2−xt1≈xc2−xc1 because the x variation by misalignment is much smaller than the moving stroke. The y-stroke of two points is actually zero, yt2 − yt1 = 0. Equation (15) is derived from these relations. The Wafer Alignment Algorithm Regardless of Rotational Center 385 Fig. 2. General conditions for wafer alignment tan αθ ≈ αθ = (Δy 2 − Δy1 ) l (15) The derived equations are much simpler and have no center terms for rotation. Considering the wafer alignment system, there are three centers, as shown Fig. 3: rotational center, wafer center, and chuck center. The positions of these three centers are different, but cannot be measured exactly or cannot be fixed at the same position. Centerless algorithm cannot give an exact solution, but an estimated one, so the iteration step is necessary. Fig. 3. Different Centers on alignment table 386 Desktop\New Approaches in Automation and Robotics Fig. 4. Concept of movement for the points in alignment The equation can be explained in another way. Fig. 4 shows the virtual alignment procedure. The inspection positions are located at both ends of the lines, and the middle point can represent the inspection points. The misalignment of the middle point can be estimated from the average of the misalignment on the two points. And the compensation value of the middle point is approximately equal to the magnitude of the misalignment, and the result can be written as (14) and (15). 3.2 Iteration and convergence The alignment properties are estimated, and it is possible that the misalignment cannot be zero after the first alignment. And manufacturing conditions can vary and are different from the ideal condition. The alternative is the iterative alignment, which is carried out until the misalignment decreases under tolerance level. Compensation values are added to the current position, and the i-th step of the alignment can be written as equation (16). It is necessary to control convergence speed, and the convergence constant is defined as η. i +1 Pc = iPc + η× i β (16) Misalignment can be defined as the magnitude of the deviation, as shown in (17). The iteration is terminated when the misalignment becomes smaller than tolerance ε. i Δ= (Δx21 + Δx22 ) + (Δy21 + Δy22 ) 2 <ε (17) The Wafer Alignment Algorithm Regardless of Rotational Center 387 As the automatic alignment proceeds, the numerical position on the machine is compensated. The magnitude of the compensation value β will decrease by the number of iterations. γ is defined as the total amount of the compensation or difference between initial position and current position. The γ will be converged to an arbitrary value if the alignment is done well. γ = i γ + η × i β = i Pc - 0 Pc i +1 (17) Fig. 5. Photo of automatic wafer dicing machine 4. Experiment 4.1 Dicing machine The algorithm was tested on the wafer dicing machine. The machine had 4 axes - x, y, z and θ. Because the z axis is actually used only for cutting action, it was excluded for alignment. Each axis is composed of a ball-screw and LM guide. The axes were accurate to the microlevel. Fig. 5 shows a picture of the dicing machine, and table 1 shows its specifications. The align mark was inspected with a PCI frame grabber, which has 0.1 sub-pixel accuracy. Two cameras were connected to the frame grabber. Very small lenses were attached to the cameras, which had same magnifications because of the align patterns. 388 Desktop\New Approaches in Automation and Robotics contents name/axis specification resolution x y θ y x y θ x y θ x y 1μm 0.2μm 2.0 x10-4deg 10000ps/mm 10mm/rev 4mm/rev 1/100(harmonic driver) 10000ps 20000ps 18000ps 7μm 0μm camera model pixel FOV exposure Sony XC-HR50 640×480 1.31mm×0.98mm 20ms frame grabber model Precision library Cog8501 0.1 sub-pixel Vision Pro 3.5 linear scale pitch motor backlash Table 1. Specification of Machine 4.2 Procedure First, a wafer was aligned manually to get a standard pattern on an inspected image. The shape of align pattern in the experiment was the cross mark. The machine was moved to search for the best pattern of a high-quality image. The image of the mark and training results were stored. The inspection positions were defined at the mechanical positions when the align pattern was located at the center of the screen. The inspection positions were defined for dicing lines of θ= 0 ° and θ= 90 °. After the position definition, the wafer was released from the table and placed again manually to give random errors. The system began aligning from 0 ° alignment, and then it proceeded to 90° alignment. The magnifications of the lenses were the same, and the macroalignment had no meaning. Three lines were aligned for 0 °, and ten for 90 °. The deviations were stored at each inspection points. The compensation values were obtained from the deviation. The system axes were compensated by these values, so the inspection positions were also changed. The inspection and compensation were iterated until the misalignment was under 1.0 pixel. The convergence constant η was varied from 0.5 to 1.5 without releasing the wafer. The experiment was repeated for 15 cases of mark locations on the vision screen, as shown in the previous report. 389 The Wafer Alignment Algorithm Regardless of Rotational Center 5. Result Wafers were aligned successfully for the 15 cases. One of the cases is shown in this paper. The variation of γ’s is shown in Fig. 6 - Fig. 11. The horizontal axis of the plots was the number of iterations, and the vertical axis was the compensation value. The thick-black line, called ’org’ is the result obtained by the use of the original equation before the simplification. The convergent path was varied by η, and the convergent speed can be controlled. When the η increased, the path showed a bigger overshoot and sharp edges. This kind of trend always occurred when the value was above 1.0. This also makes the alignment time longer. When the η drcreases, the path showed a smooth shape and longer alignment time. This trend always occurred when the η was below 1.0. There was no overshoot for this case. The original equation provided the fastest convergence for a case, but the result showed that the simplified equation was also effective for application. The best value for γx was 1.1, but that of γy was 1.0. The response of the best case was delayed about 1.0 step for the case of the original equation. 6. Conclusion The proposed equation for wafer alignment was derived from object transformation and simplified with some assumptions made. The alignment algorithm had the iteration terms with the convergence constant. The algorithm was applied to a dicing machine. After setup, the wafers were placed manually, and aligned with the proposed algorithm. The iteration was terminated until the measured misalignment became below 1.0 vision pixel. The convergence constant η varied from 0.5 to 1.5 for each case. For all 15 cases, the alignment was finished. The result showed that the simplified algorithm converged slower than the original equation. But the delay was about 1.0 step according to the convergent constant. When the η was above 1.0, the response curve had an overshoot and sharp edges. But the curve had smoothness and slower response when the η was below 1.0. The alignment algorithm was simple so that it can be applied to PLC-base systems. 0.3 0.2 0.1 0 -0.1 1 6 11 16 21 Iterations -0.2 -0.3 -0.5 -0.6 -0.7 γx(mm) -0.4 Fig. 6. Variation of γx by iteration (γx=1.1-1.5) 1.5 1.4 1.3 1.2 1.1 org 390 Desktop\New Approaches in Automation and Robotics 0.2 0.1 0 1 6 11 16 21 -0.1 Iterations -0.2 γx(mm) -0.3 -0.4 -0.5 1.0 0.9 0.8 0.7 0.6 0.5 org Fig. 7. Variation of γx by iteration (γx=0.5-1.0) 0.2 0.15 0.1 0.05 0 1 6 11 21 Iterations 16 -0.05 γy(mm) -0.1 -0.15 1.5 1.4 1.3 1.2 1.1 org Fig. 8. Variation of γy by iteration (γy=1.1-1.5) 0.15 0.1 0.05 0 1 6 11 -0.1 γy(mm) -0.05 Fig. 9. Variation of γy by iteration (γy=0.5-1.0) 16 21 1.0 0.7 org 0.9 0.6 Iterations 0.8 0.5 391 The Wafer Alignment Algorithm Regardless of Rotational Center -0.3 1 6 11 16 21 Iterations -0.35 -0.4 -0.45 γθ -0.5 -0.55 1.5 1.4 1.3 1.2 1.1 org Fig. 10. Variation of γθ by iteration (γθ=1.1-1.5) -0.1 1 6 11 16 21 Iterations -0.15 -0.2 -0.25 1.0 0.9 0.8 0.7 0.6 0.5 -0.3 org -0.35 -0.45 γθ -0.4 Fig. 11. Variation of γθ by iteration (γθ=0.5-1.0) 8. References Choi, M. H.; Koh, H. J. , Yoon, E. S., Shin, K. C. & Song, K. C., (1999) Self-Aligning Silicon Groove Technology Platform for the Low Cost Optical Module, Proceedings of Electronic Components and Technology Conference, pp. 1140-1144, ISBN 0-7803-5231-9, San Diego, June 1999, IEEE, CA Slocum, A.H. & Weber, A.C. (2003). Precision passive mechanical alignment of wafers. Journal of Microelectromechanical Systems, Vol. 12, No. 6, (Dec. 2003) pp. 826-834, ISSN 1057-7157 Anderson, E. H.; Ha, D. & Liddle, J. A. (2004) Sub-pixel alignment for direct-write electron beam lithography. Microelectronic Engineering, Vol. 73-74, (June 2004) pp. 74-79, ISSN 0167-9317 392 Desktop\New Approaches in Automation and Robotics Fan, X.; Zhang, H., Liu, S. Hu, X. & Jia, K. (2006) NIL – A low cost and high throughput MEMS fabrication method compatible with IC manufacturing technology. Microelectronics Journal, Vol. 37, No. 2, (Feb 2006) pp. 121-126, ISSN 0026-2692 Hong, S. & Fang, M. (2002) A Hybrid Image Alignment System for Fast Precise Pattern Localization. Real-Time Imaging, Vol. 8, No. 1, (Feb. 2002) 23-33, ISSN 1077-201 Kim, H. T.; Song, C. S. & Yang, H. J., (2004) 2-step algorithms for automatic alignment. Microelectronics Reliability, Vol.44, No.6, (July 2004) pp. 1165-1179, ISSN 0026-2714 Kim, H. T.; Song, C. S. & Yang, H. J. (2004) Matrix form of automatic alignment algorithm in 2D space, Proceedings of the IEEE International Conference on Mechatronics, pp. 465469, ISBN 0-7803-8599-3, Istanbul, June 2004, IEEE, Turkey Kim, H. T.; Song, C. S. & Yang, H. J. (2006) Algorithm for automatic alignment in 2D space by object transformation, Microelectorics Reliability, Vol.46, No.1, (Jan. 2006) pp. 100108, ISSN 0026-2714 Kim, H. T.; Yang, H. J. & Baek, S. Y. (2007) Iterative algorithm for automatic alignment by object transformation, Microelectorics Reliability, Vol. 47, No. 6, (June 2007) pp. 972985, ISSN 0026-2714 Kim, H. T. ; Yang H. J. & Kim, S. C., (2006) Convergence analysis of wafer alignment algorithm based on object transformation, Proceedings of the IEEE International Conference on Industrial Electorics Application, pp.1690-1695, ISBN 0-7803-9514-X, Singapore, May 2006, Singapore